Presentation Information
[15p-P05-21]High-resolution micro-ARPES study of artificial heterostructure devices
〇Koki Yamamoto1, Koki Yanagizawa1, Katsuaki Sugawara1,2,3, Hiroto Ogura2,4, Toshiaki Kato2,4, Kenzi Watanabe5,6, Takashi Taniguchi5,6, Kenichi Ozawa7, Takashi Takahashi1, Takafumi Sato1,2,8,9,10 (1.Grad. Sch. of Sci., Tohoku Univ., 2.WPI-AIMR., Tohoku Univ., 3.JST-PRESTO, 4.Grad. Sch. of Eng., 5.NIMS, 6.NIMS-MANA, 7.KEK-IMSS-PF, 8.CSIS, Tohoku Univ., 9.SRIS, Tohoku Univ., 10.MathCSS, Tohoku Univ.)
Keywords:
Graphene,Field Effect Transistor,ARPES
In this study, we fabricated field-effect transistor (FET) device based on an artificial hetero-structure and revealed it’s electronic structure of the FET device by high-resolution micro-ARPES. The FET device was fabricated by directly transferring an artificial hetero-structure with a size of about 20 μm onto a SiO2/Si semiconducting substrate. By space-resolved ARPES measurements, we find the local position of the artificial hetero-structure on the FET device, and success in observing the band structure of the artificial hetero-structure by high-resolution ARPES.
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