[16a-K103-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[16a-K103-4] Si microfabrication process using metal-assisted etching with nanoimprint technology

〇Yasutomo Masugata¹, Hideki Yamagishi¹, Takashi Terasawa¹ (1.TITC)

Keywords:

microfabrication

In the semiconductor manufacturing process, the use of complex and expensive equipment and the need for large amounts of energy have become issues. Recently, the metal-assisted etching method has been attracting attention as a new etching method because of its advantages such as low cost and anisotropic etching of Si. In this study, we investigated the metal-assisted etching process using the nanoimprinting method, which is a low-cost and low-energy process for patterning.