Session Details
[16a-K103-1~10]13.4 Si processing /Si based thin film / MEMS / Equipment technology
Sun. Mar 16, 2025 9:00 AM - 11:45 AM JST
Sun. Mar 16, 2025 12:00 AM - 2:45 AM UTC
Sun. Mar 16, 2025 12:00 AM - 2:45 AM UTC
K103 (Lecture Hall Bldg.)
Seiichiro Higashi(Hiroshima Univ.), Fujii Satoshi(N.I.T, Okinawa coll.)
[16a-K103-1]Nickel Electroplating Using a Supercritical Carbon Dioxide-Emulsified
Nickel Sulfamate Electrolyte toward MEMS Applications
〇WENDING HOU1, Tomoyuki Kurioka1, Chun-Yi Chen1, Tso-Fu Mark Chang1, Katsuyuki Machida1, Hiroyuki Ito1, Yoshihiro Miyake1, Masato Sone1 (1.Institute of Science Tokyo)
[16a-K103-2]Evaluation of Mechanical Properties of Electrodeposited Au Films on Ti/Au Multi-layered Films by Micro-compression Test
〇(B)Shota Iima1, Kurioka Tomoyuki1, Shota Kanno1, Chun Yi-Chen1, Tso-Fu Mark Chang1, Katsuyuki Machida1, Hiroyuki Ito1, Yoshihiro Miyake1, Masato Sone1 (1.Science Tokyo)
[16a-K103-3]Prototype and feasibility study of piezoelectric micromachined ultrasonic transducer for measuring axial force of bolt
〇Sho Ishimatsu1, Ayaka Otaki1, Tatsuya Shimoyama1, Yujiro Iwata1, Shinya Yoshida1 (1.Shibaura Inst. of Tech.)
[16a-K103-4]Si microfabrication process using metal-assisted etching with nanoimprint technology
〇Yasutomo Masugata1, Hideki Yamagishi1, Takashi Terasawa1 (1.TITC)
[16a-K103-5]Real-time temperature measurement of silicon wafer surface in cryogenic environment using Optical Interference Contactless Thermometry (OICT)
〇(M2)Ryunosuke Goto1, Hiroaki Hanafusa1, Seiichiro Higashi1 (1.Hiroshima Univ.)
[16a-K103-6]Observation of Lamb waves propagating in a single crystal AlN free-standing film deposited by selective growth
〇Takashi Kimura1, Noriyuki Shimoji1, Kenji Goda1, Yurina Amamoto1, Takashi Naiki1, Koji Terumoto1, Yoshiaki Oku1 (1.ROHM Co., Ltd)
[16a-K103-7]Local Electric Field in Latent Images on a Photoresist Visualized by Laser-Based Photoemission Electron Microscopy
〇Hirokazu Fujiwara1,2, Cedric Bareiile3, Mario Okawa3, Toshiyuki Taniuchi1,2 (1.GSFS, Univ. of Tokyo, 2.MIRC, Univ. of Tokyo, 3.ISSP, Univ. of Tokyo)
[16a-K103-8]Towards accurate CMP simulations: Bridging experimental data and
numerical models for 6-in SiC wafers
〇Roberto Iaconi1, Riku Tanaka1, Kevin Operiano1, Susumu Maeda1, Fumiya Kawate1, Sepasy Saeed2, Yoshifumi Watanabe2, Atsunobu Une3 (1.Aixtal Corporation, 2.Mipox Corporation, 3.National Def Acad)
[16a-K103-9]Microwave heating of ion implanted silicon wafers
〇Satoshi Fujii1, Soma Shimabukuro1, Akira Uedono2 (1.N.I.T, Okinawa Col., 2.Tsukba Univ.)
[16a-K103-10]Study of hydroponics for industrial rice production.
〇Katsuro Fukozu1,2, Koji Kashima3, Masaru Sato4, Mayumi Takeyama4, Takayuki Ohba2 (1.DWRI Inc., 2.Science Tokyo, 3.ASAHI KOGYOSHA, 4.Kitami Inst. of Tech)