[16a-K103-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)Highlighted Presentation

[16a-K103-7] Local Electric Field in Latent Images on a Photoresist Visualized by Laser-Based Photoemission Electron Microscopy

〇Hirokazu Fujiwara^1,2, Cedric Bareiile³, Mario Okawa³, Toshiyuki Taniuchi^1,2 (1.GSFS, Univ. of Tokyo, 2.MIRC, Univ. of Tokyo, 3.ISSP, Univ. of Tokyo)

Keywords:

photolithography,photoemission electron microscope,latent image

Latent images, chemical patterns formed through exposure, are typically examined after development. In this study, we attempted to visualize latent images in a photoresist using laser-based photoelectron microscopy. We demonstrated that increasing the exposure dose enhances the contrast of latent images in the micrographs. Furthermore, we discovered that exposed areas exhibit positive charging. These findings are expected to contribute to a better understanding of the dynamic behavior of secondary electrons generated during exposure.