[16a-K202-1~6] Atomic Layer Process (ALP) analysis and application technologies

10:30 AM - 10:45 AM JST(1:30 AM - 1:45 AM UTC)

[16a-K202-4] RT adsorption of Rudense^® on Ru oxide surfaces and its oxidization

〇Satoshi Suzaki¹, Haruto Suzuki², Ryo Miyazawa², Yuki Yamamoto³, Hiroyuki Oike³, Ryosuke Ebihara³, Shuya Ikemura³, Hajime Goto³, Kohei Iwanaga³, Fumihiko Hirose² (1.Faculty of Engineering Yamagata Univ., 2.Yamagata Univ., 3.Tosoh Corp.)

Keywords:

Ru oxide,ALD