[16a-K202-1~6] Atomic Layer Process (ALP) analysis and application technologies

11:30 AM - 12:00 PM JST(2:30 AM - 3:00 AM UTC)

[16a-K202-6] High selective atomic layer etching in combination with area-selective deposition

〇Masanaga Fukasawa¹ (1.SFRC, AIST)

Keywords:

semiconductor,Atomic Layer Etch,Plasma