[16a-K403-1~6] 6.2 Carbon-based thin films

9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[16a-K403-2] Characterization of Ar-plasma etching resistance of PECVD-deposited a-C:H films for the fabrication of α-Ga₂O₃ optical waveguides.

〇(M2)Koudai Iijima¹, Kota Taniguchi³, Hideo Otsuki¹, Riena Jinno¹, Mie Tohnishi⁴, Akihiro Matsutani⁴, Yasutomo Ota³, Satoshi Iwamoto^1,2 (1.RCAST U-Tokyo, 2.IIS U-Tokyo, 3.Keio Univ., 4.CFC, RIM center, Science Tokyo)

Keywords:

gallium oxide,amorphous carbon,Ar-plasma etching