Session Details

[16a-K403-1~6]6.2 Carbon-based thin films

Sun. Mar 16, 2025 9:30 AM - 11:15 AM JST
Sun. Mar 16, 2025 12:30 AM - 2:15 AM UTC
K403 (Lecture Hall Bldg.)
Toru Harigai(Gifu Univ.)

[16a-K403-1]Steering of Cathode Spot in High-Rate Filtered Arc Deposition for DLC film

〇Genki Sano1, Haru Sano1, Seiya Watanabe1, Mirano Oneda1, Hirofumi Takikawa1, Hiroaki Sugita2, Takahiro Hattori2, Hiroki Gima2 (1.Toyohashi Univ. Technol., 2.OSG Co., Ltd.)
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[16a-K403-2]Characterization of Ar-plasma etching resistance of PECVD-deposited a-C:H films for the fabrication of α-Ga2O3 optical waveguides.

〇(M2)Koudai Iijima1, Kota Taniguchi3, Hideo Otsuki1, Riena Jinno1, Mie Tohnishi4, Akihiro Matsutani4, Yasutomo Ota3, Satoshi Iwamoto1,2 (1.RCAST U-Tokyo, 2.IIS U-Tokyo, 3.Keio Univ., 4.CFC, RIM center, Science Tokyo)
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[16a-K403-3]Optical emission analysis of plasma during laser joining of hydrogenated amorphous carbon films

〇Karyu Hase1, Chihiro Nara1, Yuko Aono1, Yuki Hirata1, Naoto Ohtake1, Hiroki Akasaka1 (1.Science Tokyo)
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[16a-K403-4]Metallization of boron-doped amorphous carbon films

〇Yuji Muraoka1, Sho Enomoto2, Subaru Nakashima3, Takanori Wakita4, Takayoshi Yokoya1, Kohei Yamagami4 (1.RIIS. Okayama Univ., 2.ELST. Okayama Univ., 3.Fac. of Sci. Okayama Univ., 4.JASRI)
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[16a-K403-5]Effect of Si addition on DLC film deposited by using HiPIMS

〇Takayuki Ohta1, Yuki Miwa1, Akinori Oda2, Toru Harigai3, Hiroyuki Kousaka3 (1.Meijo Univ., 2.Chiba Inst. Technol., 3.Gifu Univ.)
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[16a-K403-6]Effects of RF Power and Gas Pressure on Amorphous Carbon Nitride Thin Films Deposited by Pressure-gradient RF Magnetron Sputtering

Kohei Takaki1, Wakana Koya1, Hiromi Shima2, Takaaki Morimoto3, 〇Masami Aono1 (1.Kagoshima Univ., 2.Commun. Eng., NDA, 3.Mater.Sci.Eng., NDA)
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