[16p-K202-1~12] Atomic Layer Process (ALP) analysis and application technologies

1:30 PM - 2:00 PM JST(4:30 AM - 5:00 AM UTC)

[16p-K202-1] Surface Reaction Analysis in Semiconductor Manufacturing Processes Using a Versatile Neural Network Potential

〇Kota Matsumoto¹, Makoto Sato¹, Yusuke Asano¹ (1.PFCC, Inc.)

Keywords:

Semiconductor Manufacturing Processes,Surface Reaction Analysis,Computational Chemistry

In recent years, as semiconductor manufacturing technology has advanced towards finer scales, the importance of understanding reactions at the atomic level in the manufacturing process has increased. In this presentation, we will focus on semiconductor manufacturing processes such as ALD (Atomic Layer Deposition), ALE (Atomic Layer Etching), and wet etching, and introduce examples of surface reaction analysis using the versatile atomic-level simulator Matlantis.