[16p-K202-1~12] Atomic Layer Process (ALP) analysis and application technologies

4:30 PM - 4:45 PM JST(7:30 AM - 7:45 AM UTC)

[16p-K202-10] Fabrication and evaluation of aluminum silicate thin films for alkali metal recovery

〇Hibiki Takeda¹, Ryo Miyazawa¹, Haruto Suzuki¹, Fumihiko Hirose¹ (1.Yamagata Univ.)

Keywords:

atomic layer deposition,aluminum silicate