[16p-K202-1~12] Atomic Layer Process (ALP) analysis and application technologies

4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)English Presentation

[16p-K202-8] Computation of Al₂O₃ ALD by trimethylaluminum with Kinetic Monte Carlo and neural
network potential

〇Yichen ZOU¹, Yuxuan Wu¹, Jun Yamaguchi¹, Noboru Sato¹, Atsuhiro Tsukune¹, Yukihiro Shimogaki¹ (1.The Univ. of Tokyo)

Keywords:

atomic layer deposition,Kinetic Monte Carlo,Trimethylaluminum