[16p-K202-1~12] Atomic Layer Process (ALP) analysis and application technologies

4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[16p-K202-9] Demonstration and evaluation of zinc aluminum oxide deposition using room temperature atomic layer deposition with a sequential adsorption

Haruto Suzuki¹, 〇Ryo Miyazawa¹, Hibiki Takeda¹, Satoshi Suzaki¹, Ryoji Oonishi¹, Fumihiko Hirose¹ (1.Yamagata Univ.)

Keywords:

ALD,complex oxide films,sequential adsorption