Presentation Information

[16p-K205-7]Study on 3D chiplets with excellent heat dissipation using high thermal conductivity insulator AlN film

〇Takeshi Takagi1, Takeki Ninomiya1, Masaaki Niwa1, Tadahiro Kuroda1 (1.The Univ. of Tokyo)

Keywords:

semiconductor,AlN,heat dissipation

Various 3DIC technologies have been developed to achieve high performance and low power consumption, but the increase in energy density has caused serious problems with temperature rise inside the chip. We have proposed the "Cool 3D Chiplet" that uses AlN, a high thermal conductivity insulator, as TSV insulator, inter-layer insulator, and inter-chip insulator to efficiently dissipate heat generated inside the chip to the outside. In this study, we investigated the effect of reducing CO2 emissions by improving the heat dissipation of 3DIC.

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