[16p-P01-1~9] 8.1 Plasma production and diagnostics

[16p-P01-6] H atom distribution over a substrate surface irradiated by low temperature plasma

〇Shohei Nanya¹, Keigo Takeda¹, Mineo Hiramatsu¹ (1.Meijo Univ.)

Keywords:

plasma,surface reaction,hydrogen

The generation of low-temperature plasma, as well as the understanding of plasma process reactions such as etching and film deposition induced on the substrate surface from a fundamental perspective, and the application of the obtained insights, are essential for technological development in this field. This study focuses on the surface reactions of radicals supplied from the ICP plasma on substrates, conducts quantitative analysis based on actual measurements of the radical density distribution (hydrogen atoms) above the substrate surface, and verifies the radical density distribution on the substrate surface through simulations.