The 72nd JSAP Spring Meeting 2025
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Session Details

Poster presentation8 Plasma Electronics : 8.1 Plasma production and diagnostics

[16p-P01-1~9]8.1 Plasma production and diagnostics

Sun. Mar 16, 2025 1:30 PM - 3:30 PM JST
Sun. Mar 16, 2025 4:30 AM - 6:30 AM UTC
P01 (Gymnasium)

[16p-P01-1]Diagnostics of Input-power Dependence of Fundamental Properties of
Capacitively-coupled RF Tetraethoxysilane Plasma

〇Tatsuya Takiguchi1, Yu Uematsu1, Oda Akinori1 (1.Chiba Inst. Technol.)
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[16p-P01-2]Effect of Charged Particles on Gas Flow Behavior in Atmospheric Pressure Plasma Jet

〇HIROMASA YAMADA1 (1.NIT, Nagano College)
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[16p-P01-3]Spectral Graph Theory-Based Reduction of Chemical Reaction Networks in Atmospheric-Pressure Low-Temperature Plasmas

〇(M1)Kaito Nishi1, Naoki Higashi1, Satoshi Tomioka1 (1.Hokkaido Univ.)
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[16p-P01-4]Study on diagnostic method of gas density distribution using discharge and optical emission delay time measurement in deep oscillation magnetron sputtering

〇Eisuke Yokoyama1, Yuki Nakagawa1, Hiroki Kobayashi1, Nobuo Nishimiya1, Masaomi Sanekata1, Masahide Tona2, Hiroaki Yamamoto2, Keizo Tsukamoto2, Kiyokazu Fuke3, Keijiro Ohshimo4, Fuminori Misaizu4 (1.Tokyo Polytech. Univ., 2.Ayabo Corp., 3.Kobe Univ., 4.Tohoku Univ.)
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[16p-P01-5]Simultaneous multi-component detected energy distribution measurement using time-of-flight mass spectrometer in the deposition region of deep oscillation magnetron sputtering.

〇Hiroki Kobayashi1, Yuki Nakagawa1, Eisuke Yokoyama1, Nobuo Nishimiya1, Masaomi Sanekata1, Masahide Tona2, Hiroaki Yamamoto2, Keizo Tsukamoto2, Kiyokazu Fuke3, Keijiro Ohshimo4, Fuminori Misaizu4 (1.Tokyo Polytech Univ., 2.Ayabo Corp., 3.Kobe Univ., 4.Tohoku Univ.)
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[16p-P01-6]H atom distribution over a substrate surface irradiated by low temperature plasma

〇Shohei Nanya1, Keigo Takeda1, Mineo Hiramatsu1 (1.Meijo Univ.)
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[16p-P01-7]Improvement of resolution in inter-electrode direction in plasma spatial profile reconstruction

〇Ryota Izumi1, Haruka Suzuki1,2, Hirotaka Toyoda1,2,3 (1.Nagoya Univ., 2.cLPS Nagoya Univ., 3.NIFS)
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[16p-P01-8]Effect of Applying Positive Pulsed Voltage to the Electrode of a Capacitively Coupled Plasma on Charge Accumulation at the Bottom of High Aspect Ratio Holes

〇(M1)Takuya Kikuchi1, Yudai Akatsuka1, Haruka Suzuki1, Makoto Moriyama2, Kota Tamura2, Shuichi Kuboi2, Daiki Iino2, Hiroyuki Fukumizu2, Kazuaki Kurihara2, Hirotaka Toyoda1 (1.Nagoya Univ, 2.KIOXIA Corp)
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[16p-P01-9]Evaluation of Incorporation of Microwave-Excited Water Vapor Plasma Ashing Process in Hybrid pMOSFET Manufacturing Process Utilizing Minimal Fab

〇Hiroki Taniguchi1, Tatsuo Ishijima1, Yasunori Tanaka1, Yusuke Nakano1 (1.Kanazawa Univ.)
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