Presentation Information
[16p-P01-8]Effect of Applying Positive Pulsed Voltage to the Electrode of a Capacitively Coupled Plasma on Charge Accumulation at the Bottom of High Aspect Ratio Holes
〇(M1)Takuya Kikuchi1, Yudai Akatsuka1, Haruka Suzuki1, Makoto Moriyama2, Kota Tamura2, Shuichi Kuboi2, Daiki Iino2, Hiroyuki Fukumizu2, Kazuaki Kurihara2, Hirotaka Toyoda1 (1.Nagoya Univ, 2.KIOXIA Corp)
Keywords:
Semiconductor process,High aspect ratio etching,Charge accumulation
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