Presentation Information
[16p-P01-9]Evaluation of Incorporation of Microwave-Excited Water Vapor Plasma Ashing Process in Hybrid pMOSFET Manufacturing Process Utilizing Minimal Fab
〇Hiroki Taniguchi1, Tatsuo Ishijima1, Yasunori Tanaka1, Yusuke Nakano1 (1.Kanazawa Univ.)
Keywords:
plasma,Water Vapor Plasma Ashing
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