[16p-P02-1~7] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[16p-P02-3] Study on cryogenic synthesis and surface modification of a-C:F thin films

〇Takumi Kanno¹, Kitahara Hiroki¹, Shinozuka Satoki², Terasawa Akihiro³, Sato Tetsuya¹ (1.Univ. of Yamanashi Faculty of Engineering, 2.Univ. of Yamanashi Center for Instrumental analysis, 3.Yamanashi Industrial Technology Center)

Keywords:

Thin film,F-DLC,Cryogenic temperature

<!--StartFragment-->Fluorine-containing amorphous carbon (a-C:F) was deposited on Si and various substrates at cryogenic temperatures by irradiating a low-energy electron beam and metastable excited species into a fluorocarbon gas condensation layer. In this study, we report on the optical properties, chemical bonding, adhesion to Si substrates, and water repellency of a-C:F.<!--EndFragment-->