The 72nd JSAP Spring Meeting 2025
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Session Details

Poster presentation8 Plasma Electronics : 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[16p-P02-1~7]8.2 Plasma deposition of thin film, plasma etching and surface treatment

Sun. Mar 16, 2025 1:30 PM - 3:30 PM JST
Sun. Mar 16, 2025 4:30 AM - 6:30 AM UTC
P02 (Gymnasium)

[16p-P02-1]Numerical Analysis of Influence of Target Materials on Fundamental Properties of HiPIMS plasma

〇Motoki Abe1, Keita Kakinuma1, Takayuki Ohta2, Akinori Oda1 (1.Chiba Inst. Technol., 2.Meijo Univ.)
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[16p-P02-2]Analysis of hydrocarbon dissociation process in CXHY+Ar plasma using quadrupole mass spectrometry

〇Shinjiro Ono1, Manato Eri1, Takamasa Okumura1, Kunihiro Kamataki1, Kazunori Koga1, Masaharu Shiratani1 (1.Kyushu Univ.)
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[16p-P02-3]Study on cryogenic synthesis and surface modification of a-C:F thin films

〇Takumi Kanno1, Kitahara Hiroki1, Shinozuka Satoki2, Terasawa Akihiro3, Sato Tetsuya1 (1.Univ. of Yamanashi Faculty of Engineering, 2.Univ. of Yamanashi Center for Instrumental analysis, 3.Yamanashi Industrial Technology Center)
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[16p-P02-4]Control of Fluorine Termination Rate on Si Substrate to Decrease Nucleation in MoS2 Synthesis

〇(M1)Ryotaro Kito1, Akihisa Ogino1 (1.Shizuoka Univ.)
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English Presentation

[16p-P02-5]Development of a Tesla Coil-Based Atmospheric Cold Plasma Device for Plastic Degradation

〇MarkNickole Helorentino Tabafa1, James Roy Lesidan1, Jumar Cadondon1,2, Maria Cecilia Galvez1, Edgar Vallar1 (1.De La Salle University, 2.University of the Philippines)
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[16p-P02-6]Electron-stimulated desorption of etching reaction products

〇Ryo Saito1, Kazuki Ozawa1, Ryusei Watanabe1, Tetsuya Sato1 (1.Yamanashi Univ.)
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[16p-P02-7]Effects of gas flow and bias voltage on surface roughness in PCVM

〇Tomoyuki Tanaka1, Mamoru Ohkubo1, Shunichiro Matsuzaka1, Masahiko Kanaoka1, Masanori Tsujioka1 (1.JTEC Corporation)
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