[16p-P02-1~7] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[16p-P02-6] Electron-stimulated desorption of etching reaction products

〇Ryo Saito¹, Kazuki Ozawa¹, Ryusei Watanabe¹, Tetsuya Sato¹ (1.Yamanashi Univ.)

Keywords:

Etching,Desorption Induced by Electronic Transitions

<!--StartFragment-->In our laboratory, we have been accumulating fundamental knowledge on “Electron Beam Induced Cryo Etching (EBI-CE)”, which is a method of etching a substrate by irradiating it with electrons or metastable excited species of rare gases on an etchant condensation layer. In this study, we conducted experiments on the decomposition and desorption of AFS (Ammonium Hexafluorosilicate) cooled to cryogenic temperatures by means of electron excitation. We also verified the effect of electron irradiation under self-termination conditions in cryogenic etching using ICP.<!--EndFragment-->