[17a-K103-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[17a-K103-4] Beam focus dependence of CW laser crystallized Si thin films

〇Satoshi Takayama¹, Sasaki Nobuo^1,2, Uraoka Yukiharu¹ (1.NAIST, 2.Sasaki Consulting)

Keywords:

LTPS,CW laser crystallization

Low-temperature polycrystalline silicon (LTPS) is expected to be used in high-performance display devices. Carrier mobility of 500 cm2 /Vs or higher can be easily achieved for Si crystallized by continuous wave laser lateral crystallization (CLC). In this study, we investigated the positioning of the focus lens, which is an important step in optimizing the conditions for CLC, by evaluating the crystallinity of the lens to reach the beam from the optical system to the sample surface.