[17a-K304-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[17a-K304-2] Nanoporous Silicon Thin Film via Plasma Co-Deposition Process for Lithium-Ion Battery Applications

〇Shin Kajita¹, Giichiro Uchida², Hirohiko Tanaka³, Kiho Tabata³, Yuta Yamamoto³, Noriyasu Ohno³ (1.Univ. of Tokyo, 2.Meijo Univ., 3.Nagoya Univ.)

Keywords:

Silicon,Lithium ion battery,Plasma

In order to increase the capacity of lithium-ion batteries, silicon (Si) is being researched as a candidate for a new anode material because its theoretical capacity per unit weight is about 10 times greater than that of graphite, it is abundant and inexpensive, and it is a promising material for high-capacity batteries. The issue with silicon electrodes is that they can peel off due to the volume change of up to 400% during charging and discharging, and the application of porous materials and thin film technology is being considered. In this study, we introduce a method for forming porous silicon thin films using helium plasma.