Presentation Information
[17p-K101-9]Comparison of I-V characteristics of needle and junction contact Schottky barrier diodes using FeS2 crystal
〇Riku Ando1, Gaku Kamio1, Ren Morita1, Yoriko Suda1, Hiroshi Fujioka2, Narihiko Maeda1 (1.Tokyo Univ. of Technology, 2.Inst. of Industrial Science, Univ. of Tokyo)
Keywords:
Schottky barrier diode,Semiconductor,Narrow gap semiconductor
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