[17p-K202-1~7] 13.3 Insulator technology

1:15 PM - 1:30 PM JST(4:15 AM - 4:30 AM UTC)

[17p-K202-2] Research on MOS structure using high dielectric constant materials TiO₂

〇Yota Uchida¹, Shohei Onizuka¹, Yositaka Iwazaki¹, Tomo Ueno¹ (1.Tokyo univ. of Agri & Tech)

Keywords:

MOS