[17p-K507-1~6] 7.3 Micro/Nano patterning and fabrication

1:00 PM - 1:15 PM JST(4:00 AM - 4:15 AM UTC)

[17p-K507-1] Applicability of Scan Projection Lithography Using a Gradient-Index Lens Array to Thick Resist Patterning

〇Toshiyuki Horiuchi¹, Naoyuki Otsuka¹, Takeharu Fukuhara¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

Keywords:

gradient-index lens array,scan projection lithography,thick resist

Scan projection lithography using a gradient-index lens array as a projection lens is effective for printing rough patterns with widths of 15 μm or more in large exposure fields. Until now, it has been used for printing resist patterns with thicknesses of around 1 μm. However, if the lithography is applicable to patterning of thick resist with thicknesses of 50-100 μm, such thick resist patterns are conveniently used for making microfluidic devices, bio-cell plates, and others. For this reason, applicability of the characteristic lithography to thick resist patterning was investigated here. The limits of resolution and aspect ratio were estimated by calculating the image blurs caused by the inclination range of imaging light rays, and the calculation results were verified by patterning experiments. It was clarified that the thick resist patterns were decently formed by the lithography using the gradient-index lens array.