Session Details
[16p-P03-1~2]8.3 Plasma nanotechnology
Sun. Mar 16, 2025 1:30 PM - 3:30 PM JST
Sun. Mar 16, 2025 4:30 AM - 6:30 AM UTC
Sun. Mar 16, 2025 4:30 AM - 6:30 AM UTC
P03 (Gymnasium)
[16p-P03-1]Preparation of ultra-hydrophobic SiO:CH particule-deposited films by PECVD method
〇Mayuki Nisio1, Yasushi Inoue1, Osamu Takai2 (1.Chiba Inst. Technol., 2.Kanto Gakuin Univ.)
[16p-P03-2]Consideration from the SFE-standpoint for practical implementation of Si nanodispersed electrodes in next generation all-solid-state Li-ion storage
〇MAKOTO KAMBARA1, Sora Kyutoku1, Tsubasa Hagiwara1 (1.Osaka Univ.)