Session Details

[10a-F212-1~6]6.2 Carbon-based thin films

Thu. Sep 10, 2026 9:00 AM - 10:30 AM JST
Thu. Sep 10, 2026 12:00 AM - 1:30 AM UTC
F212 (Frontier Rsch. in Applied Sci. Bld.)

[10a-F212-1]Impact of doping profile on electrical performance of boron-doped diamond MOSFETs

〇Jiangwei LIU1, Tokuyuki Teraji1 (1.NIMS)

[10a-F212-2]Trap-assisted tunneling in Py/Al2O3/p-type diamond MOS structures

〇Makoto Kawano1, Thomas Hamel1, Ian Park1, Yoshitaka Taniyasu1, Kazuyuki Hirama1 (1.NTT BRL)

[10a-F212-3]High-Temperature S-Parameter Characterization of H-Terminated Diamond MOSFETs

〇Hidefumi Suzaki1, Matthieu Florentin1, Haruhiko Koizumi1, Hitoshi Umezawa1 (1.Ookuma Diamond Device)

[10a-F212-4]Improvement of Electrical characteristics in Hydrogen-Terminated Diamond FETs Using Self-Assembled Monolayers

〇Hiroyuki Kamada1, Shun Naruse1 (1.Ookuma Diamond Device Co.,Ltd.)

[10a-F212-5]Evaluation of reverse leakage characteristics in p-type diamond SBD by emission microscopy

〇Kentaro Ema1, Akira Shingu1, Takuya Moriki1, Daisuke Sano1 (1.Honda R&D Co., Ltd.)

[10a-F212-6]Local surface electronic and chemical-state changes at dislocations in diamond substrates by Nano-ESCA

〇Daisuke Sano1, Takuya Moriki1, Kentaro Ema1, Sota Ono2, Hirokazu Fukidome2 (1.Honda R&D Co., Ltd., 2.RIEC, Tohoku University)