Session Details

[11p-A24-1~6]3.6 Laser processing

Fri. Sep 11, 2026 2:00 PM - 3:30 PM JST
Fri. Sep 11, 2026 5:00 AM - 6:30 AM UTC
A24 (Faculty of Info. Sci. & Tech. Bldg.)

[11p-A24-1]Open-air metal surface nitriding process utilizing laser-induced plasma

〇Naofumi Ohtsu1, Madoka Tachibana1, Eishi Hashiba1, Kazuma Numakura1, Mitsuhiro Hirano1 (1.Kitami Inst. Tech.)

[11p-A24-2]Formation of Superhydrophilic Silicone Thin Films Using ArF Excimer Laser

〇(D)Yoshimi Shibuta1, Masayuki Okoshi1 (1.NDA)

[11p-A24-3]Fluid Simulation of the Deposition Characteristics
in Pulse Laser Ablation as a Function of Pipe Diameter

〇Yutsuki Hanada1, Tamao Aoki1, Ikurou Umezu1 (1.Konan Univ.)

[11p-A24-4]Photoconductive properties of Si deposited with spherical nanoparticles

〇(M1)Takumi Sakai1, Taisei Kokushou1, Tamao Aoki1, Ikurou Umezu1 (1.Konan Univ.)

[11p-A24-5]Internal modification of 4H-SiC by femtosecond laser double-pulses

〇(M2)Yuki Yamamoto1, Yasuhiko Shimotsuma1 (1.Kyoto Univ.)

[11p-A24-6]Process Window Exploration for Ultrafast Laser Scribing of REBCO HTS Tapes

Masaki Yumoto1, 〇Dai Yoshitomi1, Shinichi Kinugasa1, Yuka Yamamuro1, Hideyuki Takada1, Hidekazu Hara2, Yasuhisa Katayama2, Kiyoshige Hirose2, Aiko Narazaki1 (1.AIST, 2.Furukawa Electric)