The 73rd JSAP Spring Meeting 2026
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Session Details

Symposium (Oral)Symposium : Atomic Layer Process (ALP) analysis and application technologies (3)

[15a-70A_101-1~7]Atomic Layer Process (ALP) analysis and application technologies (3)

Sun. Mar 15, 2026 9:00 AM - 12:20 PM JST
Sun. Mar 15, 2026 12:00 AM - 3:20 AM UTC
70A_101 (70th Anniversary Auditorium)
9:00 AM - 9:05 AM JST(12:00 AM - 12:05 AM UTC)

[15a-70A_101-1]Opening

〇Yukihiro Shimogaki1 (1.The Univ. of Tokyo)
9:05 AM - 9:35 AM JST(12:05 AM - 12:35 AM UTC)English Presentation

[15a-70A_101-2]Establishing High-Temperature Area Selective ALD Process through Surface Inhibition

〇Haonan Liu1, Ken Okoshi1, Hiroki Murakami1, Yamato Tonegawa1 (1.TEL TTS)
9:35 AM - 10:05 AM JST(12:35 AM - 1:05 AM UTC)English Presentation

[15a-70A_101-3]Thin film atomic layer deposition and selective processes

〇Rong Chen1 (1.Huazhong University of Science and Technology)
10:05 AM - 10:35 AM JST(1:05 AM - 1:35 AM UTC)English Presentation

[15a-70A_101-4]New Paradigms in Atomic Layer Deposition for 3D Semiconductor Device Fabrication

〇Han-Bo-Ram Lee1,2 (1.Incheon National University, 2.ACS Publications)
10:50 AM - 11:20 AM JST(1:50 AM - 2:20 AM UTC)English Presentation

[15a-70A_101-5]Ultra-High Aspect Ratio Test Structures in ALP Process Analytics

〇Mikko Utriainen1 (1.Chipmetrics Ltd)
11:20 AM - 11:50 AM JST(2:20 AM - 2:50 AM UTC)English Presentation

[15a-70A_101-6]Development of Atomic Layer Deposition and Atomic Layer Etching Processes for Semiconductor Device Fabrication using In Situ Diagnostics

〇Sumit Agarwal1 (1.Colorado Sch Mines)
11:50 AM - 12:20 PM JST(2:50 AM - 3:20 AM UTC)English Presentation

[15a-70A_101-7]Plasma-Based Atomic Layer Etching for Atomic-Scale Semiconductor Device Fabrication

〇Heeyeop CHAE1 (1.Sungkyunkwan Univ. (SKKU))
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