Presentation Information
[2P49]Growth and transport properties of epitaxial and sputtered CoSn thin films
*Rei Hobara1, Shota Shimizu1, Kotaro Kubo2, Ryota Akiyama1, Shuji Hasegawa1 (1. University of Tokyo, 2. JSR-UTokyo Collaboration Hub, CURIE, JSR Corporation)
We investigate the growth and transport properties of thin CoSn films, a kagome-lattice intermetallic compound recently attracting attention as a nonmagnetic Pauli paramagnet with potential topological features. Epitaxial films were grown by molecular beam epitaxy using a three-step method, and their high crystallinity was confirmed by RHEED and XRD. Comparing with sputtered polycrystalline films, we observed a marked difference in resistivity behavior: the sputtered films showed nearly thickness-independent resistivity, while the epitaxial films exhibited a strong inverse thickness dependence, indicating dominant scattering at the surface and interface. Although signature of the topological surface states were not detected in the transport, our results demonstrate successful fabrication and characterization of high-quality CoSn epitaxial films and establish their potential as a platform for future studies of flat-band and topological physics in Kagome-lattice metals.