Presentation Information
[2P53][Withdraw] Investigation of atmospheric pressure plasma reactor with mesh-grid electrode for piezoelectric polymer deposition
*EunYoung Jung1, Habeeb Olaitan Suleiman2, Choon-Sang Park3, Heung-Sik Tae2 (1. The Institute of Electronic Technology, Kyungpook National University, 2. School of Electronic and Electrical Engineering, Kyungpook National University, 3. Electrical Engineering, Milligan University)
This study investigates the discharge characteristics and deposition properties of PVDF thin film by using a APP plasma reactor with a metal mesh-grid electrode with various case studies (applied voltage, Ar gas flow, and bluff body height). To confirm the possibility of uniform large area plasma deposition, polyvinylidene fluoride (PVDF) thin film is deposited on an indium tin oxide (ITO) coated polyethylene terephthalate (PET) substrate by using an APP plasma reactor.Based on the monitoring of OES, ICCD, FE-SEM, and FT-IR, the detailed characteristics of plasma discharge and PVDF thin film are under study and will be discussed in detail.