Presentation Information

[2P54][Withdraw] Characteristics of In-Solution Plasma Polymerization for Metal Doped Polypyrrole Film Deposition

*JeongBin Nam1, Eun Young Jung2, Jae Young Kim1,2, Choon-Sang Park3, Heung-Sik Tae1 (1. School of Electronic and Electrical Engineering, Kyungpook National University, 2. The Institute of Electronic Technology, Kyungpook National University, 3. Electrical Engineering, Milligan University)
This work was investigated the metal doped polypyrrole (PPy) films in order to dope the metal elements from DC–biased metal substrates (Cu, Fe, Al) by using a SP device with three–electrode configuration. Plasma discharge properties were investigated using an oscilloscope and optical emission spectroscopy (OES). In addition, the pH and conductivity measurements were used to measure the physical properties of plasma–treated pyrrole solution by using SP reactor. Moreover, the morphology and elemental distribution properties of metal doped PPy films were examined with different substrates using field–emission scanning electron microscopy (FE–SEM).

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