Presentation Information
[2P55][Withdraw] A Study on the Plasma-Treated Fluorine Doped Tin Oxide Film by Atmospheric Pressure Plasma Reactor In Ambient Air
*Sebinn Jang1, Eun Young Jung2, Gyu Tae Bae1, Jae Young Kim1,2, Choon-Sang Park3, Heung-Sik Tae1 (1. School of Electronic and Electrical Engineering, Kyungpook National University, 2. The Institute of Electronic Technology, Kyungpook National University, 3. Electrical Engineering, Milligan University)
This study proposed a APPJs with a dielectric material around the outside of a circular Cu metal plate for large-area plasma treatment. To verify the possibility of large-area plasma treatment with a size of 3×5 cm2, we systematically investigates the surface morphology, optical, and electrical resistivity properties of FTO film treated with a novel APPJs under ambient air in terms of various plasma treatment times (0, 10, 20, 30 sec).