Presentation Information
[3D02]Current and future usage of the electron source in the electron beam mask writer
*Soshi Suzuki1, Nobuo Miyamoto1 (1. NuFlare Technology, Inc.)
Electron beam mask writers are absolutely essential for producing semiconductor devices. The process for writing has been shifting from usage of the single variable shaping beam writing method to the multi-beam writing method for the advanced electron beam mask systems. The electron source in the Multi-Beam Mask Writer system needs to have a long life. As increase in the emission current is necessary for productivity growth, the electron source must operate at higher temperatures. However, a crystal consumption rate rises during the operation of the electron source at high temperatures, and the electron source life shortens. Accordingly, operation time decreases since the system needs to be shut down for a given length of time to make an electron source replacement. Consequently, a cathode with a low work function is required to achieve the large current and long-life electron source.