Presentation Information
[3D03]Innovation of the electron source technologies to support an information explosion
*Yusuke Sakai1, Takashi Doi1, Yoshinori Momonoi1 (1. Hitachi High-Tech Corporation)
In the semiconductor industry, the cost reduction benefits achieved through device miniaturization have reached their limits, and a clear shift toward cost-oriented strategies is now evident. On the other hand, in the EUV generation, miniaturization has introduced challenges related to statistical variation and defect detection, necessitating a substantial increase in the number of measurement points. Consequently, it has become essential to significantly enhance throughput while maintaining high measurement precision in electron beam metrology systems. This requires a breakthrough in electron source technology. In this report, we outline the requirements for electron sources capable of achieving sub-nanometer measurement accuracy and discuss the feasibility of realizing such sources.