[1B01-05] Sputtering and Plasma Processes 

2:30 PM - 3:00 PM JST(5:30 AM - 6:00 AM UTC)

[1B02【依頼講演】] Multi-pulse magnetron sputtering for diamond-like carbon and vanadium oxide thin films and their time-resolved plasma diagnostics

*Takashi Kimura¹ (1. Nagoya Institute of Technology (Japan))

Multi-pulse magnetron sputtering was applied to the deposition of diamond-like carbon (DLC) and vanadium oxide thin films. For DLC deposition, a multi-short-pulse HiPIMS (High Power Impulse Magnetron Sputtering) method was employed. The film density increased from 2.17 to 2.42 g/cm³ compared with single-pulse HiPIMS, accompanied by an increase in the sp³ bond fraction. For vanadium oxide deposition, a hybrid HiPIMS/low-power pulsed magnetron sputtering (LPMS) method was proposed. The dominant phase changed from V₂O₅ to VO₂ with increasing LPMS pulse width. The electron temperature decreased whereas the electron density increased and reached a nearly steady state after several pulses. The saturation of the DLC film density and the sp³ bond fraction can be attributed to the pulse-number dependence of the electron temperature and electron density. A higher V/O atomic density ratio during LPMS suggests the feasibility of phase control in vanadium oxide films. These results reveal the characteristic plasma behavior of multi-pulse magnetron sputtering.

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