JVSS 2026
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Session Details

Oral PresentationPlasma Science and Technology (PST)

[1B06-07]Plasma Science & Technology (PST)

Tue. Sep 15, 2026 4:15 PM - 4:45 PM JST
Tue. Sep 15, 2026 7:15 AM - 7:45 AM UTC
B: Multi-purpose room 2 (1F)
Chair:Hideki Nakazawa
4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)

[1B06]Preparation and Performance Evaluation of Sputter-Deposited Yttrium Films for the Stopping and Neutralization of Recoil 221Fr Produced by the Alpha Decay of 225Ac

*Ryosuke Tsutsui1, Masaki Nakazawa1, Yu Nezu3, Shintaro Nagase1, Naoya Ozawa2, Yasuhiro Sakemi1 (1. The University of Tokyo (Japan), 2. Kyoto University (Japan), 3. Rikkyo University (Japan))
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4:30 PM - 4:45 PM JST(7:30 AM - 7:45 AM UTC)

[1B07]Effect of Magnetron Sputtering Conditions on TiZrV Coating Deposited Using a Compact NEG-Coating Device

*Ruau Watanabe1, Yasunori Tanimoto1,2, Jin Xiuguang1,2, Takashi Uchiyama2, Takashi Nogami2, Tohru Honda2 (1. The Graduate University for Advanced Studies, SOKENDAI (Japan), 2. The High Energy Accelerator Research Organization, KEK (Japan))
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