Materials Research Meeting 2025 (MRM2025)
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Poster SessionH．High-Performance Functional Materials: Preparation, Processing, and Characterization : [H-1]Ferroelectric materials and their application

[H1-P301]Poster 301

Thu. Dec 11, 2025 10:00 AM - 12:00 PM JST
Thu. Dec 11, 2025 1:00 AM - 3:00 AM UTC
Poster(G1+G2)

[H1-P301-01]Mechanochemical Synthesis of Organic-Inorganic Hybrid Ferroelectric TMCM-GaCl4 and Evaluation of Electric Properties

*Keigo Honda1, Akihiro Fukui1, Sou Yasuhara1, Takuya Hoshina1 (1. Inst. Sci. Tokyo (Japan))

[H1-P301-02]Three-Dimensional Reciprocal Space Mapping of ferroelectric BiFeO3-BaTiO3 single crystals around the Morphotropic Phase-Boundary

*Kakeru Miyata1, Mikio Shimada2, Masatoshi Watanabe2, Takayuki Watanabe2, Makoto Kubota2, Tomoyuki Koganezawa3, Ichiro Hirosawa3,4, Nobuyuki Kumada5, Satoshi Wada6, Hisato Yabuta1,2 (1. Graduate School and Faculty of Info. Sci. and Electrical Engineering, Kyushu Univ. (Japan), 2. Core Tech. Development Headquarters, Canon Inc. (Japan), 3. Japan Synchrotron Radiation Res. Inst. (Japan), 4. SAGA Light Source (Japan), 5. Center of Crystal Sci. and Tech., Univ. of Yamanashi (Japan), 6. Interdisciplinary Graduate School of Medical and Engineering, Univ. of Yamanashi (Japan))

[H1-P301-03]Ultrahigh pyroelectricity in tellurium of the van der Waals bonded cohesive 2D layers of nanosheets

*Hari Krishna Mishra1, Ana Borrás1 (1. Nanotechnology on Surfaces and Plasma Laboratory, Materials Science Institute of Seville, CSIC-US, Avd. Americo Vespucio 49, 41092, Seville, Spain (Spain))

[H1-P301-04]Copper Thin Film Formation by Mist CVD for Next-Generation Electronic Devices: Structural Control and Surface Planarization

*Tatsuki Okada1, Ryousuke Ohashi1, Htet Su Wai2, Toshiyuki Kawaharamura1,2 (1. KUT (Japan), 2. RI, KUT (Japan))

[H1-P301-05]Evaluation of ferroelectricity in divalent cation doped LiGaO2

*Sou Yasuhara1, Yuto Tomizawa1, Takuya Hoshina1 (1. Sci. Tokyo (Japan))

[H1-P301-06]Ferroelectricity and Magnetic Ordering in Ca(Ti,Mn)SiO5 Thin Films

*Hikaru Kajihara1, Satoshi Kurahashi1, Weirong Yang1, Yosuke Hamasaki2, Taro Kuwano1, Hiroki Taniguchi3, Yoshinao Kobayashi1, Shintaro Yasui1 (1. Science Tokyo (Japan), 2. NDA (Japan), 3. Nagoya Univ. (Japan))

[H1-P301-07]AR-HAXPES Evaluation of Chemical Bonding Changes in AlScN Induced by Plasma Oxidation and Nitridation

*Takuya Taniguchi1, Kazuki Goshima1, Yoshiharu Kirihara1, Yuuki Yamada1, Ryoichi Kawai1, Kuniyuki Kakushima2, Yuichiro Mitani1, Hiroshi Nohira1 (1. Tokyo city Univ. (Japan), 2. Inst. of Sci. Tokyo (Japan))

[H1-P301-08]Dielectric Characterization of Titanite-type Ca(Ti,Zr)SiO5 Thin Films

*Satoshi Kurahashi1, Hikaru Kajihara1, Taro Kuwano1, Hiroki Taniguchi2, Shintaro Yasui1, Yoshinao Kobayashi1 (1. Science Tokyo (Japan), 2. Nagoya Univ. (Japan))

[H1-P301-09]Bottom Electrode Materials Dependent Ferroelectric Properties of AlScN Films

*Hitomi Hasegawa1, Si-Meng Chen1, Takuya Hoshii1, Kazuo Tsutsui2, Hitoshi Wakabayashi2, Kuniyuki Kakushima1 (1. Science Tokyo School of Eng. (Japan), 2. Science Tokyo IIR (Japan))

[H1-P301-10]Evaluation of the Effects of Plasma Treatment on Ferroelectric Al0.8Sc0.2N

*Kazuki Goshima1 (1. Tokyo City University (Japan))
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