[A-2] Innovative devices and Sensing technology

4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)

[A-2-01] On-Wafer Polarity-Specific Response Plasma Charging Recorder
with Fin-Coupling Structure by FinFET Technology

Han-Lin Huang¹, 〇Wei Chang¹, Yu-Der Chih², Jonathan Chang², Chrong-Jung Lin¹, Ya-Chin King¹ (1. National Tsing Hua Univ. (Taiwan), 2. Taiwan Semiconductor Manufac. Company (Taiwan))

DOI:

https://doi.org/10.7567/SSDM.2024.A-2-01

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