[A-4] Advanced CMOS: Device Technology

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[A-4-05] Determining factors of the Effective Work Function of TiN/TiAlC Metal Gates for Advanced Gate-all-around CMOS Integration

〇Kenzo Manabe¹, Kazuya Uejima¹, Hiroyuki Ota¹, Yukinori Morita¹, Toshifumi Irisawa¹, Yoshihiro Hayashi¹ (1. National Inst. of Advanced Indus. Sci. and Tech. (Japan))

DOI:

https://doi.org/10.7567/SSDM.2024.A-4-05

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