2024 International Conference on Solid State Devices and Materials

2024 International Conference on Solid State Devices and Materials

Sep 1 - Sep 4, 2024Arcrea HIMEJI
International Conference on Solid State Devices and Materials
2024 International Conference on Solid State Devices and Materials

2024 International Conference on Solid State Devices and Materials

Sep 1 - Sep 4, 2024Arcrea HIMEJI

[A-5-01 (Invited)]Gate Stack Engineering of Ferroelectric HfZrO2 from Multi-Level Non-Volatile Memory (NVM) to Analog-based Synapse

〇Min-Hung Lee1, Zhao-Feng Luo1, Kuo-Yu Hsing2, Fu-Shen Chang1, Jia-Yang Lee1, Yii-Tay Chang1, Cheng-Hong Liu1(1. National Taiwan Univ. (Taiwan), 2. National Yang Ming Chiao Tung Univ. (Taiwan))
https://doi.org/10.7567/SSDM.2024.A-5-01
In order to further enhance the storage density for emerging memory, the 3D architecture and multi-level functionality are the pathways. The nonidentical thickness of double-HZO (DHZO) with an inserted Al2O3 dielectric (DE) is employed to modulate the MW to improve the fault tolerance of readouts. DHZO exhibits a homogenous corner field for the 3D GAA NS FeFET. With superlattice (SL) mode for ferroelectric-phase enhancement to integrate as DHZO will be introduced for the analog operation of multibit and synapses, as well as for comparison with SS-DHZO. This is crucial to achieving analog-based energy-efficient accelerators for synapses in computing in-memory generation.