Presentation Information
[B-4-01]High stability of the ferroelectricity against hydrogen gas in (Al,Sc)N thin films
〇Nana Sun1, Kazuki Okamoto1, Shinnosuke Yasuoka1, Soshun Doko2, Naoko Matsui2, Toshikazu Irisawa2, Koji Tsunekawa2, Hiroshi Funakubo1 (1. Tokyo Tech (Japan), 2. Canon ANELVA Corp (Japan))