Presentation Information
[C-1-04]Tungsten Carbide Hard Mask Performance in Supervia and High Aspect Ratio Patterning for BEOL Advanced Interconnects
〇Daniel Montero1, Philippe Marien1, Yannick Hermans1, Fulya Ulu Okudur1, Mattia Pasquali1, Syamashree Roy1, Chen Wu1, Nunzio Buccheri1, Victor Vega-Gonzalez1, Harinarayanan Puliyalil1, Quyang Lin1, Gilberto Casillas1, Jef Geypen1, Alfonso Sepulveda1, Frederic Lazzarino1, Seongho Park1, Zsolt Tokei1 (1. imec (Belgium))