Presentation Information
[D-4-01 (Invited)]Grating Gate GaN/AlGaN Plasmonic FETs for THz Optoelectronics Devices
〇Wojciech Knap1,2、Pavlo Sai1,2、Maksym Dub1,2、Vadym Korotyeyev3 (1. CENTERA Warsaw Univ. of Technology Warsaw (Poland)、2. UNIPRESS Polish Academy of Sciences (Poland)、3. V. Ye. Lashkaryov Institute of Semiconductor Physics, NASU, Kyiv, Ukraine (Ukraine))