Presentation Information

[D-8-03]Comparison of Single Shockley-Type Stacking Fault Expansion Rates in 4H-SiC under Ultraviolet Illumination after Hydrogen or Fluorine Ion Implantation

〇Johji Nishio1, Chiharu Ota1, Ryosuke Iijima1 (1. Toshiba Corp. (Japan))

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