[H-3] Growth

9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[H-3-02] Orthogonal Growth of a Few-Layer WS₂ Channel and an Graphene to implement the atomic length gate and the atomically thinned channel simultaneously

Hideaki Sugino¹, Hirai Tanaka¹, Kazuki Yonekubo¹, Fuminori Sasaki¹, Toshifumi Irisawa², Takeo Matsuki², Daisuke Ohori³, Kazuhiko Endo³, Issei Watanabe⁴, 〇Hirokazu Fukidome¹ (1. Research Institute of Electrical Communication, Tohoku University (Japan), 2. National Institute of Advanced Science and Technology (Japan), 3. Institute of Fluid Science, Tohoku University (Japan), 4. National Institute of Information and Communications Technology (Japan))

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