Presentation Information
[H-4-03]Ultra-thin and Low-EOT HfOx Seed Layer-assisted Deposition of High-κ Gate Dielectric on 2D Semiconductors
〇Haofei Zheng1,4, Lingqi Li1, Chenyang Li2, Sujuan Ding3, Yu-Chieh Chien1, Mingxi Chen4, Heng Xiang1, Jianwei Chai4, Yi Wan2, Dongzhi Chi4, Chuanhong Jin3, Lain-Jong Li2, Kah-Wee Ang1 (1. National Univ. of Singapore (Singapore), 2. The Univ. of Hong Kong (Hong Kong), 3. Zhejiang Univ. (China), 4. Inst. of Materials Res. and Eng., A*STAR (Singapore))