[H-5] Characterization-II

9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[H-5-03] Thermal-activation-type Electron Transport Behavior in MOCVD MoS₂ Film

〇Keisuke Atsumi¹, Shuhong Li¹, Tomonori Nishimura¹, Kaito Kanahashi¹, Vincent Tung¹, Yoshiki Sakuma², Kosuke Nagashio¹ (1. The Univ. of Tokyo (Japan), 2. National Institute of Materials Science (Japan))

Password required to view