[K-2] Oxide-TFTs II

5:15 PM - 5:30 PM JST(8:15 AM - 8:30 AM UTC)

[K-2-04] In-situ AlOx Passivation on Extremely Thin 2-nm InOx FETs for Mobility and Stability Improvement

〇Chia-Tsong Chen¹, Wen Hsin Chang¹, Toshifumi Irisawa¹, Tatsuro Maeda¹ (1. AIST (Japan))

DOI:

https://doi.org/10.7567/SSDM.2024.K-2-04

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