Presentation Information
[K-7-01]An Ultra-thin Hf1-xZrxO2 (4nm) Processing for a Low Thermal Budget (350℃) but Promising Ferroelectricity
〇Chia-Wei Hsu1, Jia-Hua Jhang1, Zheng-Lin Yang1, Chih-Yu Teng1, Yuan-Chieh Tseng1 (1. National Yang Ming Chiao Tung Univ. (Taiwan))